1100°C High-Vacuum Distillation Furnace for Material Purification

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1100°C high-vacuum distillation furnace enables precise material purification, vacuum processing, and stable thermal treatment for advanced applications.

Product Features

Furnace tube material/size (mm)

• The furnace is equipped with a high-quality quartz tube chamber designed for efficient vacuum distillation, material purification, and high-temperature processing applications. The quartz tube features a diameter of 150×1400 mm with a 5 mm wall thickness, providing excellent mechanical strength, high-temperature resistance, and reliable performance under vacuum conditions.
• One end of the quartz tube is equipped with a specially designed flange sealing structure, integrating a vacuum interface and air inlet valve. This configuration ensures effective sealing performance while allowing convenient connection to vacuum systems and controlled atmosphere sources. The reliable flange design helps maintain stable internal pressure conditions, reducing the risk of gas leakage during operation and improving process safety.
• The opposite end of the quartz tube adopts an elliptical end cap design, which enhances structural stability and provides smooth gas flow characteristics inside the chamber. This design helps optimize the distribution of vacuum and process gases, supporting more uniform thermal processing and improved material treatment results.
• The quartz tube is installed in a horizontal sliding structure, allowing convenient installation, removal, and maintenance. The sliding design improves operational flexibility and enables easier loading and unloading of samples, especially for experimental processes requiring frequent material changes.
• Made from high-purity quartz material, the tube offers excellent thermal shock resistance, chemical stability, and transparency for visual monitoring of the process. It is suitable for vacuum distillation, purification, drying, heat treatment, and advanced material research.
• Overall, the optimized quartz tube structure provides reliable sealing, flexible operation, stable vacuum performance, and excellent high-temperature durability, making it an ideal solution for laboratory research and precision thermal processing applications.

Heating element

• The furnace heating system is designed with a 170 mm inner-diameter heating zone and utilizes high-performance high-temperature alloy resistance wire from Beijing Shougang as the heating element. The resistance wire contains molybdenum elements and features a surface temperature capability of up to 1450°C, providing excellent heat generation efficiency, high-temperature stability, and long service life.
• The heating elements are precisely arranged around the furnace tube to achieve uniform heat distribution and stable thermal performance. This surrounding heating structure ensures efficient heat transfer to the processing area, reducing temperature gradients and improving temperature consistency throughout the heating zone. It is particularly suitable for precision thermal processes that require reliable and repeatable heating conditions.
• The high-temperature alloy resistance wire offers outstanding oxidation resistance, corrosion resistance, and mechanical strength under continuous high-temperature operation. Its excellent thermal stability helps maintain consistent electrical performance during repeated heating cycles, reducing power fluctuations and extending the service life of the heating system.
• The optimized heating zone design provides sufficient space for material processing while maintaining efficient thermal utilization. Combined with accurate temperature control technology, the system can achieve rapid heating, stable temperature maintenance, and reliable long-term operation.
• This advanced heating configuration is ideal for applications including vacuum distillation, material purification, heat treatment, powder processing, ceramic research, and laboratory high-temperature experiments. By combining premium alloy heating elements with an optimized furnace tube arrangement, the system delivers high efficiency, uniform heating, and dependable performance for demanding thermal processing environments.

Refractory materials

• The furnace utilizes 1700°C high-temperature alumina fiber as a key insulation material, providing excellent thermal stability, energy efficiency, and long-term durability for advanced high-temperature applications. This high-purity alumina fiber is specially designed to withstand extreme operating temperatures while maintaining outstanding insulation performance and structural reliability.
• Compared with traditional insulation materials, 1700°C alumina fiber features low thermal conductivity, low heat storage capacity, and excellent thermal insulation efficiency. Its lightweight structure reduces heat loss, enables faster heating and cooling cycles, and significantly improves overall furnace energy efficiency. The material helps maintain a stable internal temperature environment while reducing external surface temperatures, improving operational safety.
• The alumina fiber offers superior resistance to thermal shock, allowing it to withstand repeated rapid heating and cooling processes without cracking, deformation, or performance degradation. Its excellent high-temperature stability ensures reliable operation under continuous thermal stress, extending furnace service life and reducing maintenance requirements.
• With high purity and excellent chemical stability, the material resists corrosion, oxidation, and contamination, helping maintain a clean heating chamber and protecting processed materials from impurities. The fiber structure also provides good mechanical strength while maintaining lightweight characteristics, making it ideal for precision furnace insulation systems.
• 1700°C alumina fiber is widely applied in high-temperature electric furnaces, vacuum furnaces, atmosphere furnaces, sintering systems, ceramic processing equipment, and advanced material research facilities. By combining extreme temperature resistance, superior insulation performance, and long-term reliability, it provides an efficient insulation solution for demanding thermal processing environments.

Technical parameters

touchscreen

• The furnace is equipped with a 7-inch touchscreen control system, providing an intuitive and centralized operation interface for convenient equipment management. The modern touchscreen design integrates key furnace control functions into a single platform, allowing operators to easily monitor, configure, and adjust operating parameters during the entire heating process.
• Through the high-resolution touch interface, users can quickly set temperature programs, adjust process parameters, view real-time operating status, and manage furnace functions with simple and efficient operations. The clear display layout improves visibility of important information, helping operators achieve accurate control and reduce operation complexity.
• The centralized control system enhances automation and process reliability by providing a unified interface for temperature regulation, heating program management, and equipment monitoring. It supports flexible parameter adjustment according to different material processing requirements, making it suitable for various high-temperature applications such as sintering, heat treatment, ceramic firing, and laboratory research.
• The touchscreen control design also improves user experience by reducing the need for complicated manual operations. Operators can easily access frequently used settings, optimize heating processes, and improve production efficiency. The responsive interface enables faster operation and better process management, especially in environments requiring precise and repeatable thermal cycles.
• Combining intelligent control, convenient operation, and reliable performance, the 7-inch touchscreen system provides an advanced human-machine interaction solution for modern electric furnaces. It improves control accuracy, enhances operational safety, and helps ensure stable and consistent results in demanding laboratory and industrial high-temperature processing applications.

Vacuum pump system

• The furnace is equipped with a high-performance molecular pump unit designed to achieve ultra-high vacuum conditions and provide reliable vacuum support for precision thermal processing applications. The system can be connected to up to three furnace units simultaneously, offering excellent flexibility for multi-equipment operation and improving overall laboratory efficiency.
• The molecular pump unit delivers a powerful vacuum pumping capability, achieving a vacuum level of below 6.0×10⁻⁴ Pa, creating a clean and stable low-pressure environment for advanced material processing. This high vacuum performance effectively reduces contamination from residual gases and impurities, ensuring improved material purity and enhanced experimental accuracy.
• With its advanced pumping technology, the system provides rapid vacuum evacuation, stable pressure maintenance, and reliable long-term operation. It is especially suitable for applications requiring strict atmospheric control, such as vacuum sintering, material purification, thin-film preparation, heat treatment, and scientific research.
• The multi-device connection capability allows one molecular pump system to efficiently support multiple furnace platforms, reducing equipment investment and simplifying laboratory vacuum management. The compact and integrated design also improves installation convenience while maintaining high operational reliability.
• Combined with precise vacuum control, excellent pumping efficiency, and stable performance, the molecular pump unit provides an ideal vacuum solution for high-temperature electric furnaces, helping users achieve cleaner processing environments, better experimental repeatability, and higher-quality material results in demanding vacuum thermal processing applications.

gwdltherm Main Component Configuration List

Application areas

• Used for vacuum distillation, material purification, and high-temperature processing requiring precise vacuum atmosphere control.
• Applied in laboratories, universities, and research institutes for sintering, heat treatment, and advanced material research.
• Suitable for semiconductor, aerospace, electronics, and metallurgy industries requiring clean vacuum thermal processing.

Why Choose Us

• High vacuum performance ensures stable material processing.
• Multi-device connection improves laboratory efficiency.
• Reliable pumping system delivers precise vacuum control.

FAQ

Q1: What vacuum level can the molecular pump system achieve?
A: It can achieve a vacuum level below 6.0×10⁻⁴ Pa, ensuring a clean processing environment.

Q2: How many furnace units can one molecular pump support?
A: One molecular pump unit can connect with up to three devices for efficient multi-equipment operation.

Q3: What applications require this high vacuum system?
A: It is suitable for vacuum sintering, material purification, heat treatment, and advanced material research.

Q4: How does the system improve processing quality?
A: High vacuum conditions reduce contamination and improve material purity, stability, and experimental accuracy.

Q5: Is the molecular pump system reliable for long-term operation?
A: Yes, it provides stable pumping performance and reliable vacuum maintenance for continuous processing.