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Designed to perform heat treatment under vacuum, inert gas, reducing, or oxidizing atmospheres, ensuring precise and stable temperature control throughout the process.
Our laboratory tube furnaces are designed to provide stable and uniform heating environments for a wide range of experimental needs. Available in multiple configurations—including single-zone, multi-zone, split-type, and vertical-loading models—these furnaces support precise temperature control and are suitable for both small-scale material testing and continuous research applications.
Advanced three-zone vertical tube furnace with independent temperature zones and built-in gas control cabinet, ideal for gradient heating, atmosphere-sensitive processes, and complex material research. Precise thermal zoning and programmable control ensure zone uniformity and repeatability, suitable for advanced ceramics, semiconductor testing, and thermochemical experiments.
Professional-grade 1200℃ high vacuum tube furnace achieving 10⁻⁴Pa ultimate vacuum, featuring pure titanium sealing flanges and digital mass flow meters for contamination-free thermal processing of semiconductors and advanced materials.
Professional CVD multi-zone tube furnace with integrated gas control system, featuring ±1℃ temperature uniformity and programmable gas flow for precise thin film deposition. Ideal for graphene, semiconductor coatings, and nanomaterial synthesis.
Advanced multi-zone tube furnace with independent temperature control for material research, featuring customizable heating profiles and uniform thermal distribution.
Bridging lab research and industrial production with 3-zone independent heating + adjustable rotation/tilt. Perfect for material R&D (300-700℃ gradients) and 24/7 automated operation.
High-efficiency multi-station tilting tube furnace for parallel material processing. Features adjustable tilt and rotary tube design for uniform heat treatment. Ideal for catalyst research and small-batch synthesis.
